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The effect of C60 cluster ion beam bombardment in sputter depth profiling of organic-inorganic hybrid multiple thin films
Authors:Hyun Kyong Shon  Dahl Hyun Kim  Byoung Hoon Lee  Dae Won Moon
Affiliation:a Nanobio Fusion Research Center, Korea Research Institute of Standards and Science, Daejeon 305-600, Republic of Korea
b Department of Physics, Chungbuk National University, Cheongju 360-763, Republic of Korea
c Department of Chemistry, Hanyang University, Seoul 133-791, Republic of Korea
Abstract:The effects of C60 cluster ion beam bombardment in sputter depth profiling of inorganic-organic hybrid multiple nm thin films were studied. The dependence of SIMS depth profiles on sputter ion species such as 500 eV Cs+, 10 keV C60+, 20 keV C602+ and 30 keV C603+ was investigated to study the effect of cluster ion bombardment on depth resolution, sputtering yield, damage accumulation, and sampling depth.
Keywords:ToF-SIMS   Inorganic-organic multiple nm thin films   C60 cluster ion bombardment
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