采用旋转涂膜法制备基底生长的定向碳纳米管阵列

 采用化学气相沉积技术，利用旋转涂膜法制备催化剂基底材料，通过对涂膜过程中的角速度、旋转时间以及基底还原过程中温度的控制改变催化剂颗粒的分布状态，获得了粒径均匀分布的催化剂基底，该基底上催化剂颗粒集中分布在47～62 nm区间，再利用该基底生长出定向碳纳米管阵列。运用扫描电镜、透射电镜、拉曼光谱仪对样品进行了表征。结果表明旋转涂膜法制备的基底平整性好于普通的滴膜法，且较其它基底制备方法具有简单易控、可使催化剂均匀分散等特点。利用该基底制备的碳纳米管阵列定向性良好。

Aligned carbon nanotubes growing on catalyst film prepared by spin coating

Catalyst particles with narrow size distribution were prepared on glass substrate by spin coating method.The surface morphologies of the films were controlled by varying the angular velocity,circumrotate time,and deoxidized temperature.By optimizing synthesis conditions,well-distributed catalyst particles could be obtained,most of which concentrate around 47~62 nm on the catalyst film.Vertically aligned carbon nanotubes were prepared on the above catalyst film by chemical vapor deposition(CVD).The samples were characterized by scanning electron microscope,transmission electron microscope and Raman spectroscope.The results indicate that spin coating is preferable to generally used dripping method in such aspects as producing substrates with low surface roughness,restricting the catalyst particles with narrow size distribution,and facilitating the substrate-fabricating process,thus carbon nanotubes with well-ordered alignment can be synthesized.