| Beam quality improvement and focused peak intensity measurement of an intense femtosecond Ti:sapphire laser system |
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| 作者姓名： | 王文涛 蔡懿 帅斌 王文耀 江云华 林礼煌 李儒新 徐至展 |
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| 作者单位： | State Key Laboratory of High Field Laser Physics Shanghai Institute of Optics and Fine Mechanics，Chinese Academy of Sciences，Shanghai 201800，State Key Laboratory of High Field Laser Physics，Shanghai Institute of Optics and Fine Mechanics，Chinese Academy of Sciences，Shanghai 201800，State Key Laboratory of High Field Laser Physics，Shanghai Institute of Optics and Fine Mechanics，Chinese Academy of Sciences，Shanghai 201800，State Key Laboratory of High Field Laser Physics，Shanghai Institute of Optics and Fine Mechanics，Chinese Academy of Sciences，Shanghai 201800，State Key Laboratory of High Field Laser Physics，Shanghai Institute of Optics and Fine Mechanics，Chinese Academy of Sciences，Shanghai 201800，State Key Laboratory of High Field Laser Physics，Shanghai Institute of Optics and Fine Mechanics，Chinese Academy of Sciences，Shanghai 201800，State Key Laboratory of High Field Laser Physics，Shanghai Institute of Optics and Fine Mechanics，Chinese Academy of Sciences，Shanghai 201800，State Key Laboratory of High Field Laser Physics，Shanghai Institute of Optics and Fine Mechanics，Chinese Academy of Sciences，Shanghai 201800 |
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| 摘 要： | Micro-lens arrays were adopted to homogenize the beam profile of 532-nm pumping laser for the main amplifier of an intense femtosecond, chirped pulse amplification (CPA) Ti:sapphire laser. Experimental measurements showed a great improvement of the near-field pattern of the CPA beam after the main amplifier and the size of the focal spot was improved from 2.7 times diffraction limitation (DL) to 1.6 DL. The spot size focused by an f/4 off-axis parabola (OAP) in the target chamber was measured to be 5.8μm (full-width at half-maximum (FWHM)), and a peak intensity of 2.6×1020 W/cm2 was obtained at the output power of 120 TW. Peak intensity exceeding 1021 W/cm2 or even 1022 W/cm2 can be expected with smaller f-number focusing configuration and wavefront correction.
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