微圆盘电极技术测定表面化学微加工时的约束刻蚀剂浓度分布

利用微圆盘电极技术, 测定了KBr、L-胱氨酸和硫酸组成的刻蚀溶液体系中Pt电极表面电化学氧化产生的刻蚀剂Br2浓度分布, 为约束刻蚀剂层技术(CELT)中刻蚀体系的选择和优化提供更直观的依据. GaAs表面CELT微加工实验证明了用微圆盘电极测得的表面刻蚀剂的浓度分布趋势与微加工实验所得到的结果一致

Concentration Protile of Etchant Measured by Microelectrode Technique in the Process of Chemical Micromachining

A carbon-disk microelectrode was used to investigate the surface concentration profile of etchant Br2, which was electrogenerated on the Pt working electrode. The steady state reducing currents of Br2 at different distances away from the Pt electode was measured. The concentration profile was estimated from the current-distance variation curves as a function of different sampling times. Experimentally determined concentration profiles are in good agreement with those estimated from the microetching results. The microelectrode technique has offered a good method to choose suitable etching solution for chemical micromachining.