Kinetics and mechanism of oxidation of silicon nitride bonded silicon carbide ceramic |
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| Authors: | M. Thorley R. Banks |
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| Affiliation: | (1) Research & Technology, Gas Research Centre, British Gas plc, Ashby Road, LE11 3QU Loughborough, Leicestershire, UK |
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| Abstract: | Thermogravimetry (TG) has been used to study the oxidation of a commercial silicon nitride bonded silicon carbide (SNBSC) ceramic. The oxidation was studied in air and carbon dioxide atmospheres between 800 and 1300°C. TG/mass spectrometry (MS) shows that the silicon nitride bonding phase oxidises first. The kinetics follow a multi-stage mechanism with diffusion control. Carbon dioxide was found to be a more powerful oxidant than air at temperatures above 1050°C. |
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| Keywords: | ceramics kinetics MS silicon nitride bonded silicon carbide ceramic TG |
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