Optimum surface roughness for surface enhanced Raman scattering |
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| Institution: | 1. NanoFlex Limited, iTac, Daresbury Laboratory, Sci-Tech Daresbury, Keckwick Lane, Daresbury WA4 4AD, United Kingdom;2. EaStCHEM, School of Chemistry, The University of Edinburgh, Joseph Black Building, King''s Buildings, Edinburgh, Scotland EH9 3JJ, United Kingdom;1. Laboratory of Inorganic Materials Chemistry, Chemistry Department, University Badji Mokhtar of Annaba, BP: 12, Annaba 23000, Algeria;2. Laboratory of Magnetism and Spectroscopy of Solids, Department of Physics, University Badji Mokhtar of Annaba, BP: 12, Annaba 23000, Algeria;3. Department of Technology, Faculty of Technology, University 20 Août 1955 of Skikda, B.P.26, Route d''El-Hadaiek, Skikda 21000, Algeria;4. Department of Biology, College of Science, University of Bahrain, PO Box 32038, Bahrain;5. Nanotechnology Centre, University of Bahrain, PO Box 32038, Bahrain;6. Department of Physics, College of Science, University of Bahrain, PO Box 32038, Bahrain |
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| Abstract: | Surface enhanced Raman scattering from copper phthalocyanine thin films deposited onto Ag films roughened by underlayers of gas-evaporated Si particles was investigated. The surface roughness was systematically varied by varying the average size of Si particles. Results of quantitative intensity measurements indicate that there exists an optimum surface roughness depth for SERS. The maximum enhancement factor obtained is ≈1.5 x 104 and a crude estimate of the optimum roughness depth is of the order of 100 Å. The origin of presently observed enhancement is thought to be purely electromagnetic, involving the excitation of the surface plasmon modes via the surface roughness. |
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