Ellipsometry studies of albumin films on tantalum oxide and SiO2

The adsorption of (1) bovine serum albumin in acetate buffer, (2) albumin followed by glutaraldehyde crosslinking, (3) albumin followed by exposure to an albumin/glutaraldehyde solution, and (4) albumin after the surface was subjected to treatment (3), has been studied using Ta oxide/Ta chips and SiO₂/Si wafers as substrates. The films were washed, air dried and measured in air using an automatic laser ellipsometer, 6328 Å. The films formed from treatment (3) and treatment (4) have a lower refractive index and are thicker than films formed from treatment (1) and treatment (2). The adsorption of albumin on SiO₂/Si wafers seems to be slower than that on the Ta oxide/Ta surfaces.