Generalized rotating-compensator ellipsometry |
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Authors: | PS Hauge |
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Institution: | IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA |
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Abstract: | The extension of rotating-compensator ellipsometry (RCE) to measurements of the system Jones matrix J of optical systems is reported. The similarities and differences of generalized RCE as compared to other methods are noted. Measurements of several anisotropic materials, as well as of “standard” optical systems having one, two and three essential (complex) elements of J are described. Finally, a completely automated procedure for the measurement and analysis of a uniaxially anisotropic surface with the optic axis in the plane of the surface is presented. |
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