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高温氧化多孔硅的电子束辐照效应
引用本文:张学兵 郭常新. 高温氧化多孔硅的电子束辐照效应[J]. 发光学报, 1996, 17(2): 111-115
作者姓名:张学兵 郭常新
作者单位:中国科学技术大学物理系, 合肥230026
摘    要:通过高温氧化处理得到的多孔硅,其阴极射线发光谱呈现明显的三峰结构。峰强随电子束辐照时间而下降。对光致发光很弱的样品,电子束辐照后光致发光明显地增强。红外透射谱及Raman谱分析表明样品基本上成为SiOx.进一步分析指出三峰可能来源于SiOx中的缺陷中心发光。电子束辐照在SiOx禁带中引进了一些缺陷能级,通过这些能级使得紫外线可激发样品发光,出现光致发光增强的现象。

关 键 词:多孔硅  阴极射线发光  高温氧化  缺陷中心
收稿时间:1995-06-30

EFFECT OF ELECTRON IRRADIATION ON HIGH TEMPERATURE OXIDIZED POROUS SILICON
Zhang Xuebing,Guo Changxing. EFFECT OF ELECTRON IRRADIATION ON HIGH TEMPERATURE OXIDIZED POROUS SILICON[J]. Chinese Journal of Luminescence, 1996, 17(2): 111-115
Authors:Zhang Xuebing  Guo Changxing
Affiliation:Department of physics, University of Science and Technology of China, HeFei 230026
Abstract:igh temperature oxidized porous silicon has been investigated.Three peaks can be seen on the cathodeluminescent(CL)spectrum.The intensity of these peaks decreases fast with electron irradiation.For poor photoluminescent(PL)sample,the PL intensity enhances obviously after electron irradiation.The IR and Raman spectra of high temperature oxidized porous silicon show that whose strueture is mainly SiOx.Further analysis shows that three peaks may come from the luminescence of defect centers in SiOx.As electron irradiation,some other defects are generated in SiOx.This makes the CL intensity decrease and only through these defects the luminescent centers can be excited by UV light,therefore the sample's PL intensity is increased.
Keywords:porous silicon  cathodeluminescence  high temperature oxidized  defect center
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