Photoelectrochemical and characterization of intercalation compound of KTiNbO5 with methylviologen |
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| Authors: | Shanzhong Li Wei Wu Yao Zhai Xiaobo Zhang Chao Liu Lin Liu Zhiwei Tong |
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| Institution: | 1. Department of Chemical Engineering, Huaihai Institute of Technology, Lianyungang 222005, People''s Republic of China;2. Department of Electronic Engineering, Southeast University, Nanjing 210096, People''s Republic of China;3. SORST, Japan Science and Technology (JST), Kawaguchi Center Building 4-1-8, Kawaguchi-shi, Saitama 332-0012, Japan |
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| Abstract: | Methylviologen (1,1′-dimethyl-4,4′dipyridinium ion, MV2+) has been intercalated into the interlayer space of layered potassium titanoniobate (KTiNbO5) by a method involving the displacement of guest molecules using a n-hexylammonium titanoniobate (HeNH3+-TiNbO5) intercalation compound. The methylviologen titanoniobate (MV2+-TiNbO5) intercalation compound was characterized using SEM, TEM, XRD, IR and elemental analysis. The photochemical and electrochemical behaviors of the MV2+-TiNbO5 hybrid thin film were investigated. The photo excitation of oxygen-present MV2+-TiNbO5 thin film with UV light indicated the electron transfer from the titanoniobate layer to MV2+ to form MV+ radical cation. The cyclic voltammogram of the MV2+-TiNbO5 hybrid thin film exhibited two consecutive electron-transfer steps. |
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