Properties of a-Si:N:H films beneficial for silicon solar cells applications |
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Authors: | B Swatowska T Stapiński S Zimowski |
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Institution: | 1.Department of Electronics,AGH University of Science and Technology,Cracow,Poland;2.Department of Machine Design and Terotechnology,AGH University of Science and Technology,Cracow,Poland |
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Abstract: | Amorphous silicon-nitride thin films a-Si:N:H were obtained by plasma enhanced chemical vapour deposition (PECVD) method from
SiH4+NH3 at 13.56 MHz. The process parameters were chosen to obtain the films of properties suitable for optoelectronic and mechanical
applications. FTIR analysis of a-Si:N:H films indicated the presence of numerous hydrogen bonds (Si-H and N-H) which passivate
structural defects in multicrystalline silicon and react with impurities. The morpho-logical investigations show that the
films are homogeneous. The deposition of a-Si:N:H layers leads to the decrease in friction coefficient of used substrates.
Optical properties were optimised to obtain the films of low effective reflectivity, large energy gap Eg from 2.4 to 2.9 eV and refractive index in the range of 1.9 to 2.2. Reduction of friction coefficient for monocrystalline
silicon after covering with a-Si:N:H films was observed: from 0.25 to 0.18 for 500 cycles. |
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