Electrochemical oxidation of sulfodifluoroacetic acid in the presence of halogens |
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| Authors: | E A Smertenko N D Volkov S D Datsenko N V Ignat'ev |
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| Institution: | (1) Department of Chemical and Process Engineering, P.le J.F. Kennedy 1, 16129 Genoa, Italy;(2) Laboratori d’Electroqu?mica dels Materials i del Medi Ambient, Departament de Qu?mica F?sica, Facultat de Qu?mica, Universitat de Barcelona, Mart? i Franqu?s 1-11, 08028 Barcelona, Spain |
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| Abstract: | The electrochemical oxidation of sulfodifluoroacetic acid (HOSO2CF2CO2H) in the presence of Cl2 or Br2 gives halodifluoromethanesulfonic acid. The anodic oxidation of sulfodifluoromethanecarboxylate ion to form the sulfodifluoromethyl
radical as an intermediate is proposed as the rate-determining step.
Institute of Organic Chemistry, National Academy of Sciences of Ukraine, 5 Murmanskaya ul., Kiev 253094, Ukraine. Translated
from Teoreticheskaya i éksperimental'naya Khimiya, Vol. 35, No. 4, pp. 246–248, July–August, 1999. |
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