A Technique for Obtaining Thermal Resistance of the Dielectric-Substrate Contact under High-Intensity Irradiation

Heating of dielectric materials is investigated under irradiation of specimens by periodically pulsed ion-beams. The solution to the equation of thermal conductivity yields constrained variations of the specimen's temperature around its average value, with the repetition rate being that of the radiation-pulse frequency. Initially, the average variation-period temperature is found to grow, while after saturation it approaches a quasi-stationary value controlled entirely by the thermal resistance of the specimen-substrate contact under the same irradiation conditions. A method for the time-averaged dielectric temperature under saturation is proposed. Using this method, an express-technique for calculating thermal resistance of the dielectric-substrate contact is offered. It is based on periodically pulsed heating of the dielectric specimen by a moderate-density ion beam and precision measurements of the its average temperature. The error of the express technique is evaluated and so is its applicability range. A hypothesis is put forward that proceeding form this new method for thermal resistance one may determine the energy lost in ion sputtering.