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Growth of silicon nanowires on UV-structurable glass using self-organized nucleation centres
Authors:K. Tonisch, F. Weise, M. Stubenrauch, V. Cimalla, G. Ecke, F. Will, H. Romanus, S. Mrotzek, H. Hofmeister, M. Hoffmann, D. Hü  lsenberg,O. Ambacher
Affiliation:aInstitute of Micro and Nanotechnologies, Technical University of Ilmenau, P.O. Box 100565, 98684 Ilmenau, Germany;bMax-Planck-Institut für Mikrostrukturphysik, Weinberg 2, 06120 Halle, Germany
Abstract:We report on the growth of silicon nanowires on photostructurable glass by low-pressure chemical vapour deposition. Thereby, no additional catalyst was needed to stimulate the growth process. Instead, a self-organized crystallization process leads to the formation of metallic clusters and seed crystals within the glass, which are supposed to initialize the nanowire growth. The nanowires were contacted by direct deposition of Pt using a focussed ion beam system and characterized electrically.
Keywords:Nanowires   UV-structurable glass   FIB
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