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Chemoselective Deprotection of Thioacetals/Thioketals Using HIO3 in the Presence of Wet SiO2 Under Mild Solvent-Free Conditions
Authors:Moslem M. Lakouraj  Mahmood Tajbakhsh  Farhad Shirini  Mohammad V. Asady Tamami
Affiliation:1. Department of Chemistry , University of Mazandaran , Babolsar, Iran;2. Department of Chemistry , Guilan University , Rasht, Iran
Abstract:Abstract

HIO 3 in the presence of wet SiO 2 is highly efficient and a mild reagent for selective deprotection of a variety of thioacetals/thioketals to the corresponding parent carbonyl compounds at room temperature and under solvent-free conditions.
Keywords:Carbonyl compounds  deprotection  HIO3/wetSiO2  solvent-free  thioacetals/ thioketals
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