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Ni/Au与N掺杂p型ZnO的欧姆接触
引用本文:王新,吕有明,申德振,张振中,李炳辉,姚斌,张吉英,赵东旭,范希武.Ni/Au与N掺杂p型ZnO的欧姆接触[J].发光学报,2006,27(3):426-428.
作者姓名:王新  吕有明  申德振  张振中  李炳辉  姚斌  张吉英  赵东旭  范希武
作者单位:中国科学院,激发态物理重点实验室,吉林,长春,130033;中国科学院,研究生院,北京,100049
基金项目:国家高技术研究发展计划(863计划);国家自然科学基金;中国科学院知识创新工程项目
摘    要:研究了Au,In,Ni/Au三种不同金属膜与N掺杂p型ZnO的接触特性,发现Ni/Au双层膜更适合作为其欧姆电极材料,并比较了不同气氛和不同温度退火对Ni/Au电极的影响.发现在O2中退火电极性能发生蜕变,而在N2中退火性能得到改善.指出即使在N2中退火,退火温度的选择也是至关重要的,本实验在400℃,氮气气氛下退火150s,得到了较好的欧姆接触特性.

关 键 词:p-ZnO  Ni/Au  欧姆接触  退火
文章编号:1000-7032(2006)03-0426-03
收稿时间:2006-04-04
修稿时间:2006-04-042006-04-08

Ni/Au Contact to N-doped p-type ZnO
WANG Xin,LU You-ming,SHEN De-zhen,ZHANG Zhen-zhong,LI Bing-hui,YAO Bin,ZHANG Ji-ying,ZHAO Dong-xu,FAN X W.Ni/Au Contact to N-doped p-type ZnO[J].Chinese Journal of Luminescence,2006,27(3):426-428.
Authors:WANG Xin  LU You-ming  SHEN De-zhen  ZHANG Zhen-zhong  LI Bing-hui  YAO Bin  ZHANG Ji-ying  ZHAO Dong-xu  FAN X W
Institution:1. Key Laboratory of Excited State Processes, Chinese Academy of Sciences, Changchun 130033, China;2. Graduate School of the Chinese Academy of Sciences, Beijing 100049, China
Abstract:ZnO is a direct wide-band-gap(3.37 eV)semiconductor.It has attracted considerable attention as a potential candidate material for gas sensors,transparent electrode and surface acoustic wave deices,especially for ultraviolet light-emitting diodes(LEDs)and laser diodes(LDs).However,for ultimately fabricating ZnO-based optoelectronic devices,the performance of the contacts to ZnO is attracting more and more attention.This is because a good ohmic contact allows lower operating voltage and minimizes dissipation of power,while a poor ohmic property leads to poor device performance and eventually device failure.Compared with that to n-type ZnO,the fabrication of ohmic contacts to p-type ZnO is more difficult since the work function of p-type ZnO is higher than that of single metal.The contact properties of Au,In,Ni/Au to N-doped p-type ZnO films grown by MBE method were reported.The zinc(Zn)source was supplied by evaporating metal zinc with 99.999 9% through a Knudsen effusion cell.NO gas activated by an Oxford Applied Research r.f.(13.56 MHz)plasma source with a power of 300 W was used as both N and O source.Compared with Au and In contacts,Ni/Au contact is more suitable to form stable ohmic contact to p-type ZnO.The contacts behavior of Ni/Au after annealing under N2 and O2 ambient were given.It was found Ni/Au contact gave a degenerative behavior after rapid thermal annealing(RTA)under O2 ambient at the temperature of 300℃ for 150 s,while an improved contact behavior was obtained after RTA under N2 in the same temperature for 150 s.The dependence of Ni/Au contact on the annealing temperature under N2 gas ambient was investigated.With the increase of the annealing temperature,the resistances of Ni/Au contacts decrease firstly and then increase.In this experiment,after RTA at 400℃ under N2 for 150 s,the Ni/Au contact gives a better ohmic characteristic,and the contact resistivity is about 0.8 Ω·cm2.
Keywords:p-ZnO  Ni/Au  ohmic contact  annealing
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