脉冲高能量密度等离子体法类金刚石膜的制备及分析

利用脉冲高能量密度等离子体法在光学玻璃衬底上、在室温下成功的制备了光滑、致密、均匀的纳米类金刚石膜.工艺研究表明：放电电压和放电距离以及工作气体种类对纳米类金刚石膜的沉积起着关键作用.利用拉曼光谱、扫描电镜以及电子能量损失谱分析薄膜的形态结构表明：薄膜具有典型的类金刚石特征；纳米类金刚石膜的晶粒尺寸小于20nm甚至为非晶态；类金刚石膜中含有一定量的氮原子，随着沉积能量的升高，氮的含量增大.纳米类金刚石膜的薄膜电阻超过109Ω/cm2.对放电溅射过程进行了理论分析，结果与工艺研究的结论吻合.

Investigation of diamond-like-carbon films deposited on glass substrate by using a pulsed high energy density plasma gun

Smooth, densie and uniform nano-crystalline diamond-like-carbon (DLC) film is deposited on an optical glass substrate by pulsed high energy density plasma(PHEDP) gun charging in nitrogen atmosphore. Scanning electron microscope, Raman spectra and EMSA show that, the grain size of the DLC film is less than 20nm; there are a number of nitrogen atoms and nano-crystalline diamond in the DLC film. The sheet resistance of this film is larger than 109Ω/sq. When the change voltage is lower and charge distance is longer, the deposited film is loose. Theoretic analysis show that, at higher charge voltage, the deposited grain is larger, with longer charge distance, the collision force between deposition grain and substrate is weaker. The theoretic results are in agreement with the experimental conclusion.