| Abstract: | Many organochromium compounds have been used as volatile chromium sources to prepare chromium-based coatings by chemical vapor deposition. Chromium carbides, nitrides, oxides and alloys have been deposited on different substrates at low temperature (<500 °C). Organochromium precursors are reviewed and some of their draw-backs are discussed. They are classified according to the nature of the chromium-ligand bonds (carbonyls, amides, arenes or alkyls). Furthermore, experimental results obtained in the same apparatus for a series of representative precursors are reported to discuss, with literature data, how the ligand affects the composition and the structure of the films. |
