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Unravelling the essential difference between TiOx and AlOx interface layers on Ta3N5 photoanode for photoelectrochemical water oxidation |
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| Authors: | Yongle Zhao Huichen Xie Wenwen Shi Hong Wang Chenyi Shao Can Li |
| Abstract: | Tantalum nitride (Ta3N6) is a very promising photoanode material due to its narrow band gap (2.1 eV)and suitable band alignment for solar water splitting.Howeve... |
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