| 表面层对1 064 nm高反射镜损伤阈值影响 |
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| 引用本文： | 鲁江涛,焦宏飞,程鑫彬,马彬,丁涛,张锦龙,沈正祥,周刚. 表面层对1 064 nm高反射镜损伤阈值影响[J]. 强激光与粒子束, 2011, 23(4). DOI: 10.3788/HPLPB20112304.0977 |
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| 作者姓名： | 鲁江涛 焦宏飞 程鑫彬 马彬 丁涛 张锦龙 沈正祥 周刚 |
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| 作者单位： | 1. 同济大学 精密光学工程技术研究所， 上海 200092; 2. 上海市特殊人工微结构材料与技术重点实验室，上海 200092；3. 同济大学 航空航天与力学学院， 上海 200092 |
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| 基金项目： | 国家高技术发展计划项目，中国博士后科学基金，上海市博士后基金 |
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| 摘 要： | 采用电子束蒸发的方法制备了３种具有不同表面层材料及结构的中心波长为1 064 nm的零度高反镜，３种膜系表面层分别为1/4波长光学厚度的HfO2，1/2波长光学厚度的SiO2，以及1/4波长光学厚度的SiO2。光谱测试表明：三者在1 064 nm处均有较高的反射率（高于99.8%），利用热透镜的方法测量得到３个膜系辐照激光正入射情况下，薄膜对光的吸收比例分别为3.0×10-6，5.0×10-6和6.5×10-6，其损伤阈值分别为32.5，45.2和28.4 J/cm2。并在膜层内部电场分布和膜层材料物理特性的基础上分析了３种不同表面层膜系吸收和损伤阈值差别的原因。
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| 关 键 词： | 表面层 激光损伤阈值 电场分布 薄膜吸收 |
| 收稿时间： | 1900-01-01; |
Influence of outmost layer on laser induced damage threshold of 1064 nm high-reflection mirrors |
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| Lu Jiangtao,Jiao Hongfei,Cheng Xinbin,Ma Bin,Ding Tao,Zhang Jinlong,Shen Zhengxiang,Zhou Gang. Influence of outmost layer on laser induced damage threshold of 1064 nm high-reflection mirrors[J]. High Power Laser and Particle Beams, 2011, 23(4). DOI: 10.3788/HPLPB20112304.0977 |
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| Authors: | Lu Jiangtao Jiao Hongfei Cheng Xinbin Ma Bin Ding Tao Zhang Jinlong Shen Zhengxiang Zhou Gang |
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| Affiliation: | 1. Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China;2. Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, Shanghai 200092, China;3. School of Aerospace Engineering and Applied Mechanics, Tongji University, Shanghai 200092, China |
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| Abstract: | Electron beam evaporation method was applied to deposit three sets of 1 064 nm laser mirrors with different outmost layers: quarter-wavelength HfO2， half-wavelength SiO2 and quarter wavelength SiO2 layers, respectively. High reflectivity (more than 99.8%) has been achieved for all the stacks, and irradiated at normal incidence photothermal measurements of absorption are 3.0×10-6, 5.0×10-6 and 6.5×10－6, respectively. Corresponding laser induced damage thresholds (LIDTs) are 32.5 J/cm2, 45.2 J/cm2 and 28.4 J/cm2. The relations of electric field distribution, absorption, layer material characters and LIDT are also discussed． |
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| Keywords: | laser-induced damage threshold electric field distribution film absorption |
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