The use of organophotoacids for deprotection reactions in organic synthesis |
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| Authors: | Yuichi Nishikubo |
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| Affiliation: | Department of Applied Chemistry, Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522, Japan |
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| Abstract: | o-Hydroxymethylphenol was found to be an effective and environmentally benign organophotoacid. An increased acidity in the excited state, induced by photoirradiation, was sufficient for the deprotection of several protecting groups which are widely used in organic synthesis. |
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| Keywords: | Organophotocatalyst Organophotoacid Deprotection Protecting group Green chemistry |
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