SYNTHESIS OF ABA TYPE TRIBLOCK COPOLYMERS BY RADICAL POLYMERIZATION WITH 1,4-BIS(p-TERTBUTYLPHENYLSELENOMETHYL) BENZENE AS A PHOTOINIFERTER |
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Abstract: | 1,4-Bis(p-tert-butylphenylselenomethyl)benzene was used as a bifunctional photoiniferter for the polymerization of methyl methacrylate (MMA). Both the polymer yields and the number average of molecular weights ([Mbar]n) of polymers increased with the polymerization time and the [Mbar]n linearly increased with polymer yield. The addition of MMA to the poly(MMA) with irradiation increased the [Mbar]n of the polymer. Photoirradiation of telechelic polystyrene having phenylseleno groups at both ends as polymeric photoiniferter in the presence of MMA or p-chloromethylstyrene afforded effectively corresponding to the ABA type triblock copolymers. On the other hand, photopolymerization of p-methylstyrene with ABA type triblock copolymer of styrene and p-chloromethylstyrene as polymeric photoiniferter afforded to multiblock copolymer of styrene and p-substituted styrenes. |
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Keywords: | 1,4-Bis(p-tert-butylphenylselenomethyl) benzene Radical polymerization Photoiniferter Polymeric photoiniferter Methyl methacrylate p-Chloromethylstyrene p-Methylstyrene Triblock copolymers Multiblock copolymers |
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