Development of standards for reliable surface analyses by ISO technical committee 201 on surface chemical analysis |
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| Authors: | C J Powell R Shimizu K Yoshihara S Ichimura |
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| Institution: | 1. Materials Measurement Science Division, National Institute of Standards and Technology, Gaithersburg, MD, USA;2. Office for University‐Industry Collaboration, Osaka University, Osaka, Japan;3. Omicron NanoTechnology Japan, Inc., Tokyo, Japan;4. National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki, Japan |
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| Abstract: | The need for reliable surface analyses together with quality‐management requirements for analytical laboratories led the International Organization for Standardization (ISO) to form its Technical Committee (TC) 201 on Surface Chemical Analysis in 1991. This article describes the organization of TC 201, the strategies that have been found useful for identifying and assessing possible projects for new international standards, and the 57 international standards and other documents prepared to date by TC 201. Standards have now been developed for Auger‐electron spectroscopy, glow‐discharge spectroscopy, various types of scanning probe microscopy, secondary‐ion mass spectrometry, sputter‐depth profiling, total‐reflection X‐ray fluorescence spectroscopy, X‐ray photoelectron spectroscopy, and X‐ray reflectometry. In addition, standards have been developed with definitions of terms used in surface chemical analysis; the handling, preparation of specimens for surface analysis; information and data‐transfer formats; and methods for determining the lateral resolution of beam‐based methods of surface analysis. Copyright © 2014 John Wiley & Sons, Ltd. |
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| Keywords: | International standards ISO/TC 201 surface chemical analysis |
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