X-ray photoelectron spectroscopy of erbium-activated-silica–hafnia waveguides

X-ray photoelectron spectroscopy (XPS) has been used in the study of sol gel-derived Er³⁺-activated xHfO₂–(100 − x)SiO₂ (x = 10, 20, 30, 40, 50 mol) planar waveguides. The analysis of Si 2p and O 1s core lines were related to the Hf/Si molar ratio to assess the role of hafnia in modifying the silica network. Increasing the HfO₂ content brings about a change of the Si 2p and O 1s binding energy respect to those from pure silica. This trend is explained with a formation of hafnium silicate in the matrix with successive phase separation between HfO₂ and SiO₂ rich phases. XPS results show that hafnia is well dispersed in the silica matrix for molar concentration below 30%. Formation of pure HfO₂ domains was detected at higher hafnia concentrations in agreement with previous spectroscopic analyses.