A large-area photolithography technique based on surface plasmons leakage modes |
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Authors: | Guanghui Yuan Pei Wang Yonghua Lu Yong Cao Douguo Zhang Hai Ming Wendong Xu |
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Institution: | a Department of Physics, University of Science and Technology of China, Hefei, Anhui 230026, PR China b Anhui Key Laboratory Optoelectronic Science and Technology, Hefei, Anhui 230026, PR China c Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, No. 390, Qinghe Road, Jiading, Shanghai 201800, PR China |
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Abstract: | An atomic force microscope (AFM) assisted surface plasmons leakage radiation photolithography technique has been numerically demonstrated by using two-dimensional finite-difference time-domain (2D-FDTD) method. With the aid of a metallic AFM tip, particular characteristic of the Kretstchmann configuration to excite surface plasmons (SPs) is utilized to achieve large-area patterns with high spatial resolution and contrast, the photoresist could be exposed with low power laser due to the remarkable local field enhancement at the metal/dielectric interface and the resonant localized SPs modes near the tip. Good tolerance on the film thickness and incident angle has been obtained, which provides a good practicability for experiments. This photolithography technique proposed here can realize large-area, high-resolution, high-contrast, nondestructive, arbitrary-structure fabrication of nanoscale devices. |
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Keywords: | 42 50 St 42 82 Cr 73 20 Mf |
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