Multichannel silicon WDM ring filters fabricated with DUV lithography |
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Authors: | Jong-Moo Lee Sahnggi Park Gyungock Kim |
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Institution: | Electronics and Telecommunications Research Institute, 161 Gajong-dong, Yusong-gu, Daejeon 305-350, Republic of Korea |
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Abstract: | We have fabricated 9-channel silicon wavelength-division-multiplexing (WDM) ring filters using 193 nm deep-ultraviolet (DUV) lithography and investigated the spectral properties of the ring filters by comparing the transmission spectra with and without an upper cladding. The average channel-spacing of the 9-channel WDM ring filter with a polymeric upper cladding is measured about 1.86 nm with the standard deviation of the channel-spacing about 0.34 nm. The channel crosstalk is about −30 dB, and the minimal drop loss is about 2 dB. |
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Keywords: | 42 82 &minus m 42 82 Et |
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