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Multichannel silicon WDM ring filters fabricated with DUV lithography
Authors:Jong-Moo Lee  Sahnggi Park  Gyungock Kim
Institution:Electronics and Telecommunications Research Institute, 161 Gajong-dong, Yusong-gu, Daejeon 305-350, Republic of Korea
Abstract:We have fabricated 9-channel silicon wavelength-division-multiplexing (WDM) ring filters using 193 nm deep-ultraviolet (DUV) lithography and investigated the spectral properties of the ring filters by comparing the transmission spectra with and without an upper cladding. The average channel-spacing of the 9-channel WDM ring filter with a polymeric upper cladding is measured about 1.86 nm with the standard deviation of the channel-spacing about 0.34 nm. The channel crosstalk is about −30 dB, and the minimal drop loss is about 2 dB.
Keywords:42  82  &minus  m  42  82  Et
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