Mechanism of the Photodissociation of 4-Diphenyl(trimethylsilyl)methyl-N,N-dimethylaniline

On irradiation in hexane (248- and 308-nm laser light) 4-diphenyl(trimethylsilyl)methyl-N,N-dimethylaniline, 2, undergoes photodissociation of the C-Si bond giving 4-N,N-dimethylamino-triphenylmethyl radical, 3(*) (lambda(max) at 343 and 403 nm), in very high quantum yield (Phi = 0.92). The intervention of the triplet state of 2 (lambda(max) at 515 nm) is clearly demonstrated through quenching experiments with 2,3-dimethylbuta-1,3-diene, styrene, and methyl methacrylate using nanosecond laser flash photolysis (LFP). The formation of 3(*) is further demonstrated using EPR spectroscopy. The detection of the S(1) state of 2 was achieved using 266-nm picosecond LFP, and its lifetime was found to be 1400 ps, in agreement with the fluorescence lifetime (tau(f) = 1500 ps, Phi(f) = 0.085). The S(1) state is converted almost exclusively to the T(1) state (Phi(T) = 0.92). In polar solvents such as MeCN, 2 undergoes (1) photoionization to its radical cation 2(*)(+), and (2) photodissociation of the C-Si bond, giving radical 3(*) as before in hexane. The formation of 2(*)(+) occurs through a two-photon process. Radical cation 2(*)(+) does not fragment further, as would be expected, to 3(*) via a nucleophile(MeCN)-assisted C-Si bond cleavage but regenerates the parent compound 2. Obviously, the bulkiness of the triphenylmethyl group prevents interaction of 2(*)(+) with the solvent (MeCN) and transfer to it of the electrofugal group Me(3)Si(+). The above results of the laser flash photolysis are supported by pulse radiolysis, fluorescence measurements, and product analysis.