| 8.0 nm反射式偏振膜的设计和制备 |
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| 引用本文： | 吕超,易葵,邵建达. 8.0 nm反射式偏振膜的设计和制备[J]. 光子学报, 2007, 36(11): 2049-2052 |
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| 作者姓名： | 吕超 易葵 邵建达 |
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| 作者单位： | 中国科学院上海光学精密机械研究所薄膜中心,上海,201800 |
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| 基金项目： | 国家高技术研究发展计划(863计划) |
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| 摘 要： | 讨论了软X射线反射式偏振膜的设计原理和方法,利用设计软件模拟设计了8.0 nm处的Mo/B4C偏振膜.对影响多层膜性能的参量进行了详细的误差分析.利用磁控溅射镀膜机进行了偏振膜的制备研究,X射线小角衍射测量了多层膜的周期厚度,测量数据的拟合结果与设计值吻合很好.
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| 关 键 词： | 多层膜 软X射线 偏振 准布儒斯特角 |
| 文章编号： | 1004-4213（2007）11-2049-4 |
| 收稿时间： | 2006-09-05 |
| 修稿时间： | 2006-09-05 |
Designing and Fabrication of Multilayer Polarization for Soft X-ray at 8.0 nm |
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| L Chao,YI Kui,SHAO Jian-da. Designing and Fabrication of Multilayer Polarization for Soft X-ray at 8.0 nm[J]. Acta Photonica Sinica, 2007, 36(11): 2049-2052 |
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| Authors: | L Chao YI Kui SHAO Jian-da |
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| Affiliation: | L(U) Chao,YI Kui,SHAO Jian-da |
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| Abstract: | The design principle and method of multilayer polarizing elements for soft x-ray region was discussed. The Mo/B4C multilayer was designed by 8 nm designing software. Parameter of the multilayer structure was studied and the impact of their misnomer on the multilayer polarizing elements was analyzed.Mo/B4C multilayer was fabricated by magnetron sputtering and proved that it has perfect periodic structure through small angle XRD research. The period of the multilayer is 5.76 nm and it is quite near to our devise. |
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| Keywords: | Multilayer Soft X-ray Polarization Bruster angle |
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