Practical separation of silicon isotopes by IRMPD of Si2F6 |
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Authors: | S Arai H Kaetsu S Isomura |
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Institution: | (1) Kyoto Institute of Technology, Matsugasaki, Sakyo-ku, 606 Kyoto, Japan;(2) The Institute of Physical and Chemical Research, Wako-shi, 351-01 Saitama, Japan |
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Abstract: | Large-scale silicon isotope separation based on the IRMPD of natural Si2F6 has been carried out using a commercially available high power CO2 TEA laser and a flow reaction system. The decomposition product SiF4 containing 19–33% of 30Si was obtained at a production rate of 1.5×10–2–2.6×10–2 mol·h–1, depending on experimental parameters such as laser wavelength, laser fluence, pressure, and flow rate. SiF4 containing 12% of 29Si was obtained under slightly different conditions, i.e., at a shorter wavelength than that for 30Si. When 39% of Si2F6 was decomposed at a slow flow rate, residual Si2F6 was found to have 99.7% of 28Si. The production rate was 4.2×10–2 mol·h–1. |
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Keywords: | 82 50 |
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