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Erratum to “Comparison of the ZnO:Al films deposited in static and dynamic modes by reactive mid-frequency magnetron sputtering” [J. Crystal Growth 253 (2003) 117–128] |
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| Authors: | R. J. Hong X. Jiang B. Szyszka V. Sittinger S. H. Xu W. Werner G. Heide |
| Affiliation: | a Fraunhofer Institute for Surface Engineering and Thin Films, Bienroder Weg 54 E, D-38108, Braunschweig, Germany b Institute of Non-Metallic Materials, Technical University of Clausthal, Zehntnerstr. 2A, D-38678, Clausthal-Zellerfeld, Germany |
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