| Ni-Mn-Ga磁控溅射靶材合金制备及性能 |
| |
| 引用本文： | 陈峰华,张敏刚,柴跃生,杨利斌,熊杰.Ni-Mn-Ga磁控溅射靶材合金制备及性能[J].微纳电子技术,2011,48(9):568-572,582. |
| |
| 作者姓名： | 陈峰华 张敏刚 柴跃生 杨利斌 熊杰 |
| |
| 作者单位： | 太原科技大学材料科学与工程学院,太原,030024 |
| |
| 基金项目： | 山西省自然科学基金(2010011032-1);山西省研究生创新基金(20093096);太原市大学生创新创业专题项目(100115154) |
| |
| 摘 要： | 根据Ni-Mn-Ga合金靶材在磁控溅射过程中各元素溅射产额和靶材成分的不同,对薄膜成分的影响进行了分析,从而制备了马氏体转变温度高于室温的Ni55 Mn24.5 Ga20.5靶材.针对目前没有标准的Ni-Mn-Ga马氏体PDF卡片,使用模拟结合已有文献的方法对制备的合金X射线衍射峰进行标定.由于差示扫描量热仪(DSC)...
|
| 关 键 词： | 薄膜成分 马氏体类型 相变温度 磁控溅射 溅射产额 |
Preparation and Performance of the Ni-Mn-Ga Magnetron Sputtering Target Material Alloy |
| |
| Chen Fenghua,Zhang Mingang,Chai Yuesheng,Yang Libin,Xiong Jie.Preparation and Performance of the Ni-Mn-Ga Magnetron Sputtering Target Material Alloy[J].Micronanoelectronic Technology,2011,48(9):568-572,582. |
| |
| Authors: | Chen Fenghua Zhang Mingang Chai Yuesheng Yang Libin Xiong Jie |
| |
| Institution: | (College of Materials Science and Engineering,Taiyuan University of Science and Technology,Taiyuan 030024,China); |
| |
| Abstract: | According to the difference of the sputtering yield and target material composition for the various elements of the Ni-Mn-Ga target materials alloy in the process of magnetron sputtering,the effect of the thin film composition was analyzed,and the Ni55Mn24.5Ga20.5 targets were prepared.The martensitic transformation temperature of the Ni55Mn24.5Ga20.5 targets is higher than the room temperature.Without the standard for the Ni-Mn-Ga martensite PDF card,the prepared alloy X-ray diffraction peak was calibrated by using the simulation and consulting the relative literature.Due to the difficulty of the phase transformation temperature measurement for the film by differential scanning calorimetry(DSC),the method for the film phase transformation temperature measurement through the M-T curve of the martensite and the parent phase was presented,and the alloy was validated.The preparation of the alloy with 450 K Curie temperature provides an experimental basis for exploring the impact of the film composition on the magnetic properties further. |
| |
| Keywords: | film composition martensite type phase-change temperature magnetron sputtering sputter yield |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
|
