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Trimethylchlorosilane, (CH3)3SiCl: OH reaction kinetics and infrared spectrum |
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| Authors: | Dimitrios K. Papanastasiou François Bernard James B. Burkholder |
| Affiliation: | 1. Earth System Research Laboratory, Chemical Sciences Division, National Oceanic and Atmospheric Administration, Boulder, Colorado Cooperative Institute for Research in Environmental Sciences, University of Colorado, Boulder, Colorado;2. Earth System Research Laboratory, Chemical Sciences Division, National Oceanic and Atmospheric Administration, Boulder, Colorado |
| Abstract: | Rate coefficients for the OH + (CH3)3SiCl (trimethylchlorosilane) gas-phase reaction were measured over the temperature range 295–375 K using a pulsed laser photolysis laser-induced fluorescence technique. The room temperature rate coefficient was determined to be k1(295 K) = (2.51 ± 0.13) × 10−13 cm3 molecule–1 s–1. The Arrhenius expression k1(T) = (7.06 ± 2.15) × 10−12 exp[–(992 ± 101)/T] cm3 molecule–1 s–1, where the quoted uncertainties are 2σ fit precision, describes the measured temperature dependence very well. As part of this work, the infrared spectra of CH3)3SiCl was measured. |
| Keywords: | gas-phase OH radical pulsed laser photolysis laser-induced fluorescence temperature dependence trimethylchlorosilane |