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Low-Barrier Hydrogen Bonds in Negative Thermal Expansion Material H3[Co(CN)6]
Authors:Kasper Tolborg  Dr Mads R V Jørgensen  Dr Mattia Sist  Dr Aref Mamakhel  Dr Jacob Overgaard  Prof?Dr Bo B Iversen
Institution:1. Center for Materials Crystallography, Department of Chemistry and iNANO, Aarhus University, Langelandsgade 140, 8000 Aarhus C, Denmark;2. Center for Materials Crystallography, Department of Chemistry and iNANO, Aarhus University, Langelandsgade 140, 8000 Aarhus C, Denmark

MAXIV Laboratory, Lund University, Fotongatan 2, 22594 Lund, Sweden

Abstract:The covalent nature of the low-barrier N?H?N hydrogen bonds in the negative thermal expansion material H3Co(CN)6] has been established by using a combination of X-ray and neutron diffraction electron density analysis and theoretical calculations. This finding explains why negative thermal expansion can occur in a material not commonly considered to be built from rigid linkers. The pertinent hydrogen atom is located symmetrically between two nitrogen atoms in a double-well potential with hydrogen above the barrier for proton transfer, thus forming a low-barrier hydrogen bond. Hydrogen is covalently bonded to the two nitrogen atoms, which is the first experimentally confirmed covalent hydrogen bond in a network structure. Source function calculations established that the present N?H?N hydrogen bond follows the trends observed for negatively charge-assisted hydrogen bonds and low-barrier hydrogen bonds previously established for O?H?O hydrogen bonds. The bonding between the cobalt and cyanide ligands was found to be a typical donor–acceptor bond involving a high-field ligand and a transition metal in a low-spin configuration.
Keywords:chemical bonding  electron density  hydrogen bonds  neutron diffraction  X-ray diffraction
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