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Redox-mediated Negative Differential Resistance (NDR) Behavior in Perylenediimide Derivative: A Supramolecular Approach
Authors:Raman Khurana  Dr. Jyotirmayee Mohanty  Dr. Narayanan Padma  Dr. Nilotpal Barooah  Dr. Achikanath C. Bhasikuttan
Affiliation:1. Radiation & Photochemistry Division, Bhabha Atomic Research Centre, Mumbai, 400 085 India

Homi Bhabha National Institute, Anushakti Nagar, Mumbai, India;2. Homi Bhabha National Institute, Anushakti Nagar, Mumbai, India

Technical Physics Division, Bhabha Atomic Research Centre, Mumbai 400 085, India;3. Radiation & Photochemistry Division, Bhabha Atomic Research Centre, Mumbai, 400 085 India

Abstract:Deaggregated perylenediimide (PDI) derivatives exhibit exceptionally high quantum yields, photostability and appropriate molecular features for organic electronics. This work demonstrates a metal–dye–metal framework with a large and stable negative differential resistance (NDR) at ambient conditions, built using a supramolecular strategy. The deaggregation achieved through the encapsulation of the bay-substituted phenyl groups of aggregated (l/d )-Phe-PDI dyes by the β-CD macrocyclic host is validated through detailed spectroscopic and imaging techniques. The host–guest interaction resulted in a dramatic enhancement in the emission yield from 0.28 to 0.90. In the thin film deposits, the β-CD/(l/d )-Phe-PDI complex displayed well-connected sheet-like morphology, whereas the uncomplexed (l/d )-Phe-PDI dye remained as scattered lumps. The large and reversible I–V characteristics displaying strong NDR behavior is attributed to the oxidation/reduction processes involving the rigid π-rich PDI core and is stable at least for about six months at ambient conditions, a promising system for organic electronics applications.
Keywords:deaggregation  host–guest complex  I–V characteristics  negative differential resistance  perylene diimide dyes
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