Novel vinyl ether functionalized fluorene polymers for active incorporation into common photoresist matrices |
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| Authors: | Alexander J.C. Kuehne Allan R. Mackintosh Bernd Tieke |
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| Affiliation: | a University of Strathclyde, Department of Pure and Applied Chemistry, 295 Cathedral Street, Glasgow G1 1XL, United Kingdom
b University of Cologne, Institut für Physikalische Chemie, Luxemburger Straße 116, 50939 Cologne, Germany |
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| Abstract: | A novel vinyl ether functionalized fluorene monomer was prepared to produce a series of fluorene-based polymers with different emitter units to cover emission in the visible spectrum whilst retaining the same main absorption profile. The vinyl ether functionality allows for active incorporation of the light emitting polymers into standard vinyl ether and glycidyl ether photoresist materials. This enables photopatterning of light emitting structures for application in UV down-conversion, waveguiding and for lasing media. |
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| Keywords: | Crosslinkable polymer Conjugated polymer Vinyl ether functionalized fluorene Photoresist Polymer blends Photolithography |
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