| 利用磁控溅射技术在熔融石英衬底上生长铟锡氧薄膜的结构和形貌特性研究 |
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| 引用本文： | 吴琼,邢杰,刘斯彪,周惟公,赵长春.利用磁控溅射技术在熔融石英衬底上生长铟锡氧薄膜的结构和形貌特性研究[J].物理实验,2010,30(3). |
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| 作者姓名： | 吴琼 邢杰 刘斯彪 周惟公 赵长春 |
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| 作者单位： | 1. 中国地质大学(北京)地球物理与信息技术学院,北京,100083
2. 中国地质大学(北京)材料科学与工程学院,北京,100083 |
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| 基金项目： | 中国地质大学(北京)大学生创新实验项目和校内青年基金项目资助 |
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| 摘 要： | 利用磁控溅射技术在熔融石英衬底上沉积铟锡氧薄膜(ITO),讨论了生长温度、沉积时间、激光辐照和退火对ITO薄膜结构及形貌的影响.随着沉积温度的升高和沉积时间的延长,薄膜的晶化程度得到明显的改善,方块电阻降低,并且薄膜的形貌从光滑表面的圆形多晶颗粒演变到枝杈形貌.短时间的脉冲激光辐照使得枝杈的尖状晶粒变得圆滑,导电性略有改善.ITO薄膜在可见光区的透过率在经过空气中退火处理后明显得以改善,平均透过率可以达到80%.
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| 关 键 词： | ITO薄膜 磁控溅射 晶化 形貌 |
Structural and morphological characteristics of ITO thin films prepared by rf magnetron sputtering on fused-quartz |
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| WU Qiong,XING Jie,LIU Si-biao,ZHOU Wei-gong,ZHAO Chang-chun.Structural and morphological characteristics of ITO thin films prepared by rf magnetron sputtering on fused-quartz[J].Physics Experimentation,2010,30(3). |
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| Authors: | WU Qiong XING Jie LIU Si-biao ZHOU Wei-gong ZHAO Chang-chun |
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| Institution: | WU Qiong a,XING Jie b,LIU Si-biao a,ZHOU Wei-gong b,ZHAO Chang-chun b (a.School of Geophysics , Information Technology,b.School of Materials Science , Technology,China University of Geosciences,Beijing 100083,China) |
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| Abstract: | ITO thin films are deposited by rf magnetron sputtering on fused-quartz substrates.The influence of growth temperature,deposition time,laser irradiation and post annealing on the structure and morphology of ITO films are discussed.It is found that with the increase of deposition temperature and time,the degree of crystallization is greatly improved,the sheet resistance decreased,and the morphology of films changed from circular polycrystalline grain to branchy fraction.After laser irradiation,the films beco... |
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| Keywords: | ITO thin film magnetron sputtering crystallization morphology |
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