Chemical mechanisms in C3F8-H2 radiofrequency discharges |
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| Authors: | Riccardo d'Agostino Francesco Cramarossa Santolo De Benedictis |
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| Affiliation: | (1) Centro di Studio per la Chimica dei Plasmi, C.N.R., Dipartimento di Chimica, Università di Bari, Via Amendola 173, 70126 Bari, Italy |
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| Abstract: | Discharges fed with C3F8-H2 mixtures have been studied by means of mass spectrometry in a tubular reactor operated at 0.5 torr and 50 W. Comparison of the results with those obtained with emission actinometry give additional evidence that emission actinometry and mass spectrometry are powerful diagnostic tools to monitor stable and unstable species in discharges utilized for dry etching and polymer depositions. Mechanisms for end product formation and polymer deposition are also discussed. |
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| Keywords: | Etching and polymerization mechanism C3F8-H2 discharge fluorocarbons |
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