(1) Department of Electronic Engineering, Tohoku University, 980-8579 Sendai, Japan;(2) Department of Geoscience and Technology, Tohoku University, 980-8579 Sendai, Japan
Abstract:
We demonstrate the validity of very simple methods for site-controlled carbon nanotube growth using a radio-frequency magnetron-type plasma-enhanced chemical vapor deposition technique. Enhanced plasma density and optimized ion-bombardment energy achieved by magnetic field introduction are found to be responsible for the uniform and well-aligned carbon nanotube growth. Based on these results, we attempted to perform experiments on site-controlled carbon nanotube growth using very convenient methods such as scratching or simply masking a substrate surface where carbonaceous materials deposit. PACS 61.46.+w; 52.80.Pi; 81.15.Gh