| Affiliation: | 1. National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan;2. Kyushu University, 6-1 Kasuga-kouen, Kasuga, Fukuoka 816-8580, Japan;1. Department of Electronics and Communication Engineering, Haldia Institute of Technology, HIT Campus, Haldia 721657, West Bengal, India;2. Department of Physics, Tamralipta Mahavidyalaya, Tamluk 721636, West Bengal, India;3. Department of Physics, Jalpaiguri Government Engineering College, Jalpaiguri 735102, West Bengal, India;4. CSIR—Central Mechanical Engineering Research Institute, Durgapur 713209, West Bengal, India;1. Jo?ef Stefan Institute, Jamova 39, 1000 Ljubljana, Slovenia;2. Jo?ef Stefan International Postgraduate School, Jamova 39, 1000 Ljubljana, Slovenia;3. Laboratoire CRISMAT, UMR 6508 CNRS/ENSICAEN, 6 bld Maréchal Juin, 14050, Caen Cedex, France;1. Thin Film Physics Department, Institute for Technical Physics and Materials Science, Research Centre for Natural Sciences, Hungarian Academy of Sciences, Konkoly-Thege M. str. 29-33, 1121 Budapest, Hungary;2. Institute for Materials Science and Technology, Bay Zoltán Nonprofit Ltd for Applied Research, Fehérvári str. 130, 1116 Budapest, Hungary;1. Air Force Research Laboratory, Materials and Manufacturing Directorate (AFRL/RXA) Wright-Patterson AFB, OH, 45433-7707, USA;2. University of Dayton Research Institute, Dayton, OH, 45469-0170, USA;3. Center of Excellence for Thin Film Research and Surface Engineering, University of Dayton, Dayton, OH 45469-0170, USA;4. Departments of Physics, University of Dayton, Dayton, OH, 45469, USA;5. Commissariat à l''Energie Atomique et aux Energies Alternatives, SPEC CEA, CNRS, Université Paris-Saclay, F-91191, Gif sur Yvette Cedex, France;6. Université de Paris-Sud, F-91405, Orsay Cedex, France |
