Sensitivity Enhancement of Polyorganophosphazenes to Radiation with 2,2,4,4,6,6-Hexakis(2-Hydroxyethyl Methacrylate)Cyclotriphosphazene Monomer and its Application for Negative Resists |
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| Authors: | G L Grune R W Greer R T Chern V T Stannett |
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| Institution: | 1. Department of Chemical Engineering , North Carolina State University , Raleigh, North Carolina, 27695;2. ABB/TTI , 1021 Main Campus Drive, Raleigh, North Carolina, 27606;3. Department of Chemical Engineering , Virginia Polytechnic Institute and State University , Blacksburg, Virginia, 24060;4. Merck and Co., Inc. , WP-78-110, Sumneytown Pike, West Point, Pennsylvania, 19486 |
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| Abstract: | Abstract This work focuses on the application of a multifunctional phosphazene monomer, 2,2,4,4,6,6-hexakis(2-hydroxyethyl methacrylate)-cyclotriphosphazene (6-Hema) for enhancement of the sensitivity of polyphosphazenes to both 60Co and E-beam radiation. Specifically, elastomeric and glassy phosphazene polymer films treated with 6-Hema were irradiated under vacuum, and the gel content was determined. The Charlesby-Pinner approach was used to compare the radiation sensitivities of these films. This served as the basis for eventually preparing SiO2 wafers with thin films of the glassy polyphosphazenes mixed with or overcoated by the 6-Hema monomer. The SiO2 wafers prepared with the most sensitive polymer/monomer system were patterned with an ERC electron beam accelerator/scanning electron microscope computer-driven instrument. It was determined that these negative resist films were 1-2 orders of magnitude more sensitive to radiation than the polymers without the monomer. |
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