| SiO2薄膜的液相沉积及特性 |
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| 引用本文： | 张世春,汪金祥.SiO2薄膜的液相沉积及特性[J].应用光学,2000,21(5):30-36. |
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| 作者姓名： | 张世春 汪金祥 |
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| 作者单位： | 中国科学院西安光机所,陕西,西安,710068 |
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| 摘 要： | 将基片浸入到低温SiO2过饱和的六氟硅酸（H2SiF6)溶液中，在其表面上沉积SiO2薄膜，这种新的生长工艺称之为液相沉积（LPD）。本文着重介绍LPD工艺及LPDSiO2薄膜的特性。
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| 关 键 词： | 液相沉积 薄膜 二氧化硅 |
IPD OF SiO2 FILM AND ITS PROPERTIES |
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| ZHANG Shi-chun,WANG Jin-xiang.IPD OF SiO2 FILM AND ITS PROPERTIES[J].Journal of Applied Optics,2000,21(5):30-36. |
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| Authors: | ZHANG Shi-chun WANG Jin-xiang |
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| Abstract: | A silica(SiO 2) film was deposited on the surface of a sub 6 strate by immersing it into hydro fluosilisic acid(H 2SiF 6) solution supersaturated with silica gel at low temperature.This process is called liquid phase deposition(LPD).This new LPD process and some properties of the LPD SiO 2 film are presented in this paper. |
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| Keywords: | liquid phase deposition SiO 2 film |
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