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Material properties and effective work function of reactive sputtered TaN gate electrodes |
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| Authors: | Zhang Manhong Huo Zongliang Wang Qin Liu Ming Laboratory of Nanofabrication Novel Device Integration |
| Institution: | Zhang Manhong~ ,Huo Zongliang,Wang Qin,and Liu Ming Laboratory of Nanofabrication and Novel Device Integration,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029,China |
| Abstract: | |
| Keywords: | metal gate thermal stability effective work function dipole |
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