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Finite element simulation of hydrostatic stress in copper interconnects
Authors:Yuan Guangjie  Chen Leng School of Materials Science  Engineering  University of Science  Technology Beijing  Beijing  China
Institution:Yuan Guangjie and Chen Leng School of Materials Science and Engineering,University of Science and Technology Beijing,Beijing 100083,China
Abstract:This work focuses on numerical modeling of hydrostatic stress,which is critical to the formation of stress-induced voiding(SIV) in copper damascene interconnects.Using three-dimensional finite element analysis, the distribution of hydrostatic stress is examined in copper interconnects and models are based on the samples, which are fabricated in industry.In addition,hydrostatic stress is studied through the influences of different low-k dielectrics,barrier layers and line widths of copper lines,and the resul...
Keywords:copper interconnects  hydrostatic stress  stress-induced voiding  finite element method  
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