Phase formation process of sputtered NiCr(37:63) thin films

The phase formation process of NiCr(37:63) thin films has been investigated using the x-ray diffraction method. The films were deposited onto Si-wafers by means of d.c. magnetron sputtering. The structure of the as-deposited layers was amorphous. As a result of subsequent thermal annealing the crystallization process took place characterized by the formation of b.c.c. Cr-rich solid solution, metastable σ-NiCr-phase, and f.c.c. Ni-rich solid solution, respectively. Besides lattice constants, grain sizes and texture of the formed phases were determined.