基于MOF (Cu)@biochar气凝胶的制备及其在缓释氮肥上的应用

以羧甲基纤维素(CMC)、明胶和MOF(Cu)@biochar为原料,采用简单有效的冷冻干燥方法制备了(CMC/Gelatin/MOF(Cu)@biochar)杂化气凝胶,并用傅里叶变换红外光谱(FT-IR)、热重分析(TG)、X射线粉末衍射(XRD)、扫描电镜(SEM)和X射线光电子能谱(XPS)技术对其进行了表征;研究了MOF(Cu)@biochar含量、pH和不同的盐水溶液对杂化气凝胶溶胀行为的影响;以该气凝胶负载氯化铵,制备了一种新型缓释肥料(SRF),并研究了含2%(wt)SRF的沙性土壤的保水能力;SRF在土壤中第30天的累积释放率为79.4%;肥料在土壤中释放符合非Fickian扩散和阳离子交换的协同作用机理。     

Computing upward topological book embeddings of upward planar digraphs

We describe a unified approach for studying book, point-set, and simultaneous embeddability problems of upward planar digraphs. The approach is based on a linear time strategy to compute an upward planar drawing of an upward planar digraph such that all vertices are collinear. Besides having impact in relevant application domains of graph drawing and computational geometry, the presented results open new research directions in the area of upward planarity with constraints of the positions of the vertices.     

A note on Hadwiger’s conjecture for W5-free graphs with independence number two

The Hadwiger number of a graph $G$, denoted $h\left(G\right)$, is the largest integer $t$ such that $G$ contains $K_t$ as a minor. A famous conjecture due to Hadwiger in 1943 states that for every graph $G$, $h\left(G\right)\ge \chi \left(G\right)$, where $\chi \left(G\right)$ denotes the chromatic number of $G$. Let $\alpha \left(G\right)$ denote the independence number of $G$. A graph is $H$-free if it does not contain the graph $H$ as an induced subgraph. In 2003, Plummer, Stiebitz and Toft proved that $h\left(G\right)\ge \chi \left(G\right)$ for all $H$-free graphs $G$ with $\alpha \left(G\right)\le 2$, where $H$ is any graph on four vertices with $\alpha \left(H\right)\le 2$, $H=C_5$, or $H$ is a particular graph on seven vertices. In 2010, Kriesell subsequently generalized the statement to include all forbidden subgraphs $H$ on five vertices with $\alpha \left(H\right)\le 2$. In this note, we prove that $h\left(G\right)\ge \chi \left(G\right)$ for all $W_5$-free graphs $G$ with $\alpha \left(G\right)\le 2$, where $W_5$ denotes the wheel on six vertices.     

Hybrid abstractions of affine systems

This paper considers the problem of building a set of hybrid abstractions for affine systems in order to compute over approximations of the reachable space. Each abstraction is based on a decomposition of the continuous state space that is defined by hyperplanes generated by linear combinations of two vectors. The choice of these vectors is based on consideration of the dynamics of the system and uses, for example, the left eigenvectors of the matrix that defines these dynamics. We show that the reachability calculus can then be performed on a combination of such abstractions and how its accuracy depends on the choice of hyperplanes that define the decomposition.     

Hybrid Electrodes Used in Polymer Electro-Optic Modulator with Ultra-Broadband

Hybrid electrode combined coplanar waveguide (CPW) and microstrip lines in ultra-broadband electro-optic modulators. The characteristics of the modulators with hybrid electrode is like that of the modulator with the microstrip lines, in which the microstrip electrode is loaded above only one arm of Mach-Zehnder (M-Z) optical waveguide, besides the problem of microstrip line to coaxial transition and corona polarization in polymer modulators have been best solved at the same time. By using finite element method (FEM), the characteristic parameters such as half-wave voltage, modulation bandwidth characteristic impedance, effective microwave refractive index of polymer modulators with microstrip line and hybrid electrode are analysed and compared in this paper. The results present that velocity match, impendence match and lower microwave propagating loss is easily realized in modulators with hybrid electrode.     

微模塑法制备PMMA/SiO2二氧化硅杂化材料微结构

以摩尔比为 1∶1的甲基丙烯酸甲酯 (MMA)、甲基丙烯酸 (3 三乙氧基硅烷基 )丙酯 (ESMA)单体、0 .2 %(单体总量的质量分数 )的偶氮二异丁腈AIBN引发剂和四氢呋喃 (THF)溶剂 ,及 2 0 % (总质量分数 )的正硅酸乙酯TEOS合成出PMMA/SiO2 有机 无机杂化的杂化溶胶 .将溶胶在洗净的普通光学玻璃基片表面甩膜 .利用软刻蚀中的微模塑法 ,把有机硅弹性印章复制有精细图纹一面轻放在杂化溶胶膜上进行微模塑 ,外加 1N压力于12 0℃下处理 2h使溶胶凝胶化 .印章剥离后在基片表面就形成了PMMA/SiO2 有机 无机杂化材料的微图纹结构 .从微图纹的光学显微镜照片可以看出微模塑方法制备杂化材料复制的图纹精细度高 ,操作简单易行 ,是一类比较理想的微细图纹结构加工的方法 .