Performance improvement of PI controller with nonlinear error shaping function: IDA-PBC approach

The general dilemma faced in a conventional linear proportional-integral (PI) controller is to achieve the best transient performance (i.e. fast rise time and low overshoot level) at the same time. However, fast response is usually accompanied by high overshoot level. On the other hand, very stable control without overshoot is usually achieved at the expense of a more sluggish response to set point changes and load disturbances. Therefore, compromise between fast response and low overshoot level should be made. In this paper, to overcome these contradictions and limitations, nonlinear error shaping function (ESF) is introduced to amplify gain at low error level but reduce gain at high error level. Firstly, interconnection and damping structure for the closed-loop system composed of PI controller and first-order plant is revealed based on the port-controlled hamiltonian with dissipation (PCHD) formation. Secondly, passivity analysis is performed by the interconnection and damping assignment (IDA) passivity-based control (PBC) algorithm. In simulation studies, several nonlinear error shaping functions are examined and compared to verify performance improvements.     

Summary of ISO/TC 201 Technical Report: ISO/TR 19319:2013 – Surface chemical analysis – Fundamental approaches to determination of lateral resolution and sharpness in beam‐based methods

This Technical Report revises ISO/TR 19319:2003 —Surface chemical analysis—Auger electron spectroscopy and X‐ray photoelectron spectroscopy—Determination of lateral resolution, analysis area and sample area viewed by the analyser. The revised Technical Report gives a short introduction to basic models of image formation and introduces functions which characterize the performance of imaging instruments with respect to lateral resolution and sharpness. The determination of lateral resolution by imaging of square‐wave gratings and the determination of sharpness by imaging of narrow stripes and straight edges are described in detail. Finally, physical factors affecting lateral resolution, analysis area and sample area viewed by the analyser are discussed. Copyright © 2013 John Wiley & Sons, Ltd.     

Edge method for measuring source spot-size and its principle

The edge method is used to measure the source spot-size. In this paper, the measuring principle and applying range are discussed. It is shown that the method can directly be used to measure the spot-size of either light source, or low-energy x-ray source, or x-ray source with an energy higher than 250 keV.     

利用数字摄像法测量雾含水量的算法研究

雾含水量是研究雾结构的一个重要的因子,与天气密切相关的重要气象物理量.目前国内外对雾含水量的测量主要还是采用人工采样测量,相当费时费力.通过建立雾天大气点扩散函数模型,提出了利用数字摄像法测量雾含水量,取得了较为满意的仿真实验结果.     

Lateral resolution of secondary ion mass spectrometry–results of an inter‐laboratory comparison

Recently, BAM organised an inter‐laboratory comparison focussed on lateral resolution and accuracy of sub‐micron length measurements by secondary ion mass spectrometry (SIMS). Results were submitted by 16 laboratories from 10 countries. The task was to analyse a cross‐sectioned semiconductor multilayer stack. The resulting strip pattern in the surface of the sample shows narrow strips, step transitions and gratings of different periods. Imaging analysis of this pattern enables the determination of relevant parameters related to the lateral resolution: (i) The width (FWHM) of the primary ion beam, (ii) the distance between 16% and 84% intensity points in a profile across the image of a step transition and (iii) the modulation of intensity in the images of gratings with different periods. The parameter's data reported by the participants vary in a wide range. A strong variation in the data of primary ion beam width was observed for results measured with the same type of instrument. The distance between two narrow strips was measured with high accuracy. Twelve of sixteen of the submitted values are within the limits of uncertainty of the reference value 964 ± 35 nm. This result shows that the calibration of the length scale of the SIMS instruments is already rather precise in most of the participating laboratories. Copyright © 2006 John Wiley & Sons, Ltd.