溶胶-凝胶制备技术与新型催化材料Ⅲ.溶胶粒子表面修饰方法制备催化膜

提出用溶胶粒子表面修饰方法，结合溶胶凝胶技术制备无机催化膜．该方法的基本原理是利用合适的金属配合物在胶粒表面的吸附作用，经溶胶凝胶过程，将活性组分结合到无机膜中．实验测定结果表明：（ＮｉＥＤＴＡ）２－，ＶＯ－３，ＭｏＯ２－４，（Ｐｄ（ＮＨ３）４）２＋，ＰｄＣｌ２－４，ＰｔＣｌ２－６和ＲｈＣｌ３－６可用来修饰ＡｌＯＯＨ溶胶．以Ｐｄ／γＡｌ２Ｏ３催化膜的制备为例，经三次溶胶凝胶过程，可制得无裂缺的厚度为９μｍ的Ｐｄ／γＡｌ２Ｏ３催化膜，膜材料的平均孔直径为６ｎｍ，Ｐｄ被均匀地分布在膜的顶层，其平均粒径为２３ｎｍ．     

平果铝高压溶出过程结疤形成影响因素探索

平果铝高压溶出过程，结疤的形成是不可避免的，而且对生产带来的危害也很大。对结疤形成影响因素的研究，对于生产中结疤的治理，强化氧化铝生产具有十分重要的意义。     

ZnS∶Zn,Pb蓝粉在低压阴极射线激发下的应用

通过对ZnS∶Zn,Pb蓝色荧光粉进行表面包覆SiO2以改善其稳定性;In2O3材料的适量混合,提高了荧光粉的导电性,降低了它的起辉电压。采用沉淀法制备荧光屏,考察了阳极电压和阳极电流对亮度以及衰减过程的影响,实验结果表明ZnS∶Zn,Pb的性能优于ZnS∶Ag,Cl和ZnS∶Zn,可适用于FED等低压显示器。     

二次阳极氧化方法制备有序多孔氧化铝膜

通过二次阳极氧化方法制备多孔氧化铝膜与一次阳极氧化方法制备多孔氧化铝膜孔排布规律性的对比 ,结果发现 ,二次阳极氧化方法制取的多孔氧化铝膜孔排布规律性明显好于一次阳极氧化法制取的多孔膜 .在几个微米范围内 ,孔呈理想的六角排布 .去除一次阳极氧化膜后 ,二次阳极氧化得以在更良好的表面进行 ,制取的氧化铝膜孔规律性和有序度更高 .有序区域的尺寸与晶粒内的亚晶大小有一定关系     

Microwave-assisted Regioselective 1-O-Deacylation of Peracylated Glycopyranoses on Alumina

A facile, rapid and regioselective method for the 1-O-deacylation of peracylated glycopyranoses is described which occurs under mild conditions by absorption onto alumina using microwave irradiation.     

Morphology of Platinum Nanowire Array Electrodepostied Within Anodic Aluminium Oxide Template Characterized by Atomic Force Microscopy

Unifrom platinum nanowires were synthesized by electrodepositing the platinum under a very low altering current frequency(20Hz) and increasing voltage(5-15V）in the proes of anodic aluminium oxide(AAO) template. Atomic force microscopy observation indicates that the template membranes we obtained have hexagonally clse-packed nanochannels.The platinum nanowires have highly ordered arrays after partially dissolving the aluminium oxide membrane.With the increasing dissolvoing time,the platinum nanowire array collapsed.A concave topography of the aluminium substrate was observed after the aluminium oxide membrane was dissolved completely and the platinum nanowires were released from the template.Platinum nanowires were also characterized by transmission electron microscopy and the phase structure of the Al/AAO/Pt composite was proven by x-ray diffraction.     

Field Emission from Silicon Nanocrystallite Films with Compact Alignment and Uniform Orientation

Patterned silicon nanocrystallite (SINC) films were fabricated on (100) orientation p-type boron-doped sificon wafer by the hydrogen ion implantation technique and the anodic etching method. The efficient field emission with low turn-on field of about 3.5V/μm at current density of 0.1μA/cm^2 was obtained. The emission current density from the SiNC films reached 1mA/cm^2 under a bias field of about 9.1V/μm. The experimental results demonstrate that there are great potential applications of the SiNC films for fiat panel displays. A surface treatment with hydrogen plasma was performed on the SiNC films and a significant improvement of emission properties was achieved.