光电平台无角位移减振机构运动分析

分析了光电平台的工作环境和角振动对成像质量的影响，应用空间机构学原理和减振理论，设计了一种既具减振功能又能抑制角位移的无角位移减振机构。对减振机构的减振机理及运动特性进行了分析，并利用三维建模软件和MSC．Visual Nastran 4D仿真分析软件对该减振机构进行了三雏实体仿真分析，通过输出的仿真数据及曲线检验无角位移减振原理的正确性。     

电子电路中抗EMI设计

电磁干扰(EMI)可分为传导干扰和辐射干扰,消除干扰的方法可以采用硬件方法和软件方法,硬件方法主要有屏蔽、接地、隔离和滤波等,而软件方法主要是滤波。笔者对各种方法进行总结,并指出各种方法所存在的问题以及适用场合,并对一些常用方法提出改进措施。     

一种多晶硅高温压力传感器

制作压力传感器时，在二氧化硅层上淀积多晶硅膜，既可利用优良的机械特性，又可保证压敏电阻与衬底间具有良好的绝缘性，由此可大大提高器件的温度特性。介绍了一种多晶硅压力传感器的原理和设计。实验结果表明，这类传感器具有灵敏度好，精度高等特点，电路工作范围为０－２５０℃，且具有良好的温度稳定性。     

提高塑封双列直插式光耦合器绝缘耐压的设计和工艺要点

介绍了研制出其性能达国际先进公司同类产品水平的塑封双列直插式光耦合器的工作原理和提高绝缘耐压的技术难点，从引线框架设计、加工精度控制、内包封材料选型、理想内包封形状控制、塑封气密性的实现、环境条件的完善等方面讨论了提高绝缘耐压的设计和工艺要点。     

STI process steps for sub-quarter micron CMOS

This paper presents Shallow Trench Isolation (STI) process steps for sub-1/4 μ CMOS technologies. Dummy active areas, vertical trench sidewalls, excellent gap filling, counter mask etch step and CMP end point detection, have been used for a 0.18 μm CMOS technology. Electrical results obtained with a 5.5 nm gate oxide thickness show good isolation down to 0.3 μm spacing. Good transistor performances have been demonstrated.     

SOI全介质隔离与高频互补双极兼容工艺

ＳＯＩ材料的全介质隔离技术与高频互补双极工艺的结合是研制抗辐照能力强、频带宽、速度高的集成运算放大器的理想途径，从实验的角度提出了一种ＳＯＩ材料全介质隔离与高频互补双极工艺兼容的工艺途径。     

Synthesis and characterization of highly fluorescent europium functionalized β-diketonate complexes

Several functionalized β-diketones and their europium complexes have been synthesized and characterized. The UV-Vis absorption, photoluminescent spectra, thermal and electrochemical properties of these complexes were investigated. The thermal analysis shows that the complexes have good thermal stability. By introducing the number of extended phenyl rings we succeeded in obtaining europium complexes with extremely high photoluminescent quantum yield (PLQY) in solution due to strong site isolation effect.     

Walk－off型光隔离器的隔离度和插入损耗分析

本文介绍了与偏振无关的ｗａｌｋ－ｏｆｆ型光隔离器的原理和结构，从理论和实验两方面分析了影响隔离度和插入损耗的因素，定量计算了加工、调整误差、消光比等对隔离度和插损的限制，给光隔离器的选材、加工和调整提供了依据。     

1μm宽硅深槽刻蚀技术

介绍了硅深槽刻蚀的基本原理和影响刻蚀效果的几个主要工艺因素。提出了一种实现１μｍ宽的硅深槽刻蚀工艺途径；并给出了１μｍ宽、８μｍ深、侧壁及底部光洁的硅深槽刻蚀工艺条件。     

Transfer matrix approach of vibration isolation analysis of periodic composite structure

The transmission properties of elastic waves propagating in a three-dimensional composite structure embedded periodically with spherical inclusions are analyzed by the transfer matrix method in this paper. Firstly, the periodic composite structures are divided into many layers, the transfer matrix of monolayer structure is deduced by the wave equations, and the transfer matrix of the entire structure is obtained in the case of boundary conditions of displacement and stress continuity between layers. Then, the effective impedance of the structure is analyzed to calculate its reflectivity and transmissivity of vibration isolation. Finally, numerical simulation is carried out; the experiment results validate the accuracy and feasibility of the method adopted in the paper and some useful conclusions are obtained. Project (No. 50075029) supported by the National Natural Science Foundation of China.