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1.
Navab SinghAuthor Vitae Moitreyee Mukherjee-RoyAuthor VitaeSohan Singh MehtaAuthor Vitae 《Microelectronics Journal》2003,34(4):237-245
The patterning of contact holes by selecting out-of-focus image plane (defocus) using attenuated phase shift masks (APSM) has been studied. Defocus is found to enhance the image modulation at low partial coherence for contact holes with negative local average of mask function. Semi-dense holes up to 130 nm in 8% APSM have been printed by 0.5 μm defocus at a partial coherence of 0.31 using KrF scanner with highest numerical aperture of 0.68. However, these holes were closed with in-focus imaging. Defocus is also found to be beneficial for patterning the pitches that have extensive side lobes with in-focus imaging. 相似文献
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微波体声波延迟线的电磁屏蔽 总被引:1,自引:1,他引:0
本文分析了微波体声波延迟线多层介质的电磁屏蔽效应,结果表明,全屏蔽方式可以有效地解决微波延迟线研制中的直通抑制问题。实验结果证实了理论分析。 相似文献
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J. R. Lindle W. W. Bewley I. Vurgaftman J. R. Meyer J. L. Johnson M. L. Thomas W. E. Tennant 《Physica E: Low-dimensional Systems and Nanostructures》2004,20(3-4):558
A self-referencing, optical modulation technique was used to measure the negative luminescence efficiencies of an array of mid-wave infrared HgCdTe photodiodes with cutoff wavelength 4.6 μm as a function of sample temperature. The internal efficiency at a wavelength of 4 μm was 93% at 295 K, and nearly independent of temperature in the 240–300 K range. This corresponds to an apparent temperature reduction >50 K at room temperature and >30 K at 240 K. Moreover, the reverse-bias saturation current density was only 0.13 A/cm2. The measured transmission and emission spectra were simulated using empirical HgCdTe absorption formulas from the literature. 相似文献
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We have performed selective area epitaxy (SAE) of CdTe layers grown by molecular beam epitaxy using a shadow mask technique.
This technique was chosen over other SAE techniques due to its simplicity and its compatibility with multiple SAE patterning
steps. Features as small as 50 microns × 50 microns were obtained with sharp, abrupt side walls and flat mesa tops. Separations
between mesas as small as 20 microns were also obtained. Shadowing effects due to the finite thickness of the mask were reduced
by placing the CdTe source in a near normal incidence position. Intimate contact between the mask and the substrate was essential
in order to achieve good pattern definition. 相似文献
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本文介绍了彩色显像管荫罩黑化反应的机理,详细说明了DX气制气流程,以及DX气的成分对黑化膜品质的影响。计算分析了成分不同的煤气在制成DX气时的成分变化。同时还分析了黑化工艺和黑化设备对煤气成分波动的适应性,及在生产实践中改变DX气制气时的煤气空气对黑化膜质量的影响。 相似文献