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1.
A double optimal projection method that involves projections for intra-cluster and inter-cluster dimensionality reduction are proposed for video fingerprinting. The video is initially set as a graph with frames as its vertices in a high-dimensional space. A similarity measure that can compute the weights of the edges is then proposed. Subsequently, the video frames are partitioned into different clusters based on the graph model. Double optimal projection is used to explore the optimal mapping points in a low-dimensional space to reduce the video dimensions. The statistics and geometrical fingerprints are generated to determine whether a query video is copied from one of the videos in the database. During matching, the video can be roughly matched by utilizing the statistics fingerprint. Further matching is thereafter performed in the corresponding group using geometrical fingerprints. Experimental results show the good performance of the proposed video fingerprinting method in robustness and discrimination. 相似文献
2.
Facile non‐lithographic route to highly aligned silica nanopatterns using unidirectionally aligned polystyrene‐block‐polydimethylsiloxane films 下载免费PDF全文
Zhe Qiang Maurice L. Wadley Bryan D. Vogt Kevin A. Cavicchi 《Journal of Polymer Science.Polymer Physics》2015,53(15):1058-1064
Thin films (monolayer and bilayer) of cylinder forming polystyrene‐block‐polydimethylsiloxane (PS‐b‐PDMS) were shear aligned by the swelling and deswelling of a crosslinked PDMS pad that was physically adhered to the film during solvent vapor annealing. The nanostructures formed by self‐assembly were exposed to ultraviolet‐ozone to partially oxidize the PDMS, followed by calcination in air at 500 °C. In this process, the PS segments were fully decomposed, while the PDMS yielded silica nanostructures. The highly aligned PDMS cylinders were thus deposited as silica nanolines on the silicon substrate. Using a bilayer film, the center‐to‐center distance of these features were effectively halved from 38 to 19 nm. Similarly, by sequential shear‐alignment of two distinct layers, a rhombic array of silica nanolines was fabricated. This methodology provides a facile route to fabricating complex topographically patterned nanostructures. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2015 , 53, 1058–1064 相似文献
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In this paper, we describe a method for increasing the external efficiency of polymer light‐emitting diodes (LEDs) by coupling out waveguided light with Bragg gratings. We numerically model the waveguide modes in a typical LED structure and demonstrate how optimizing layer thicknesses and reducing waveguide absorption can enhance the grating outcoupling. The gratings were created by a soft‐lithography technique that minimizes changes to the conventional LED structure. Using one‐dimensional and two‐dimensional gratings, we were able to increase the forward‐directed emission by 47 % and 70 %, respectively, and the external quantum efficiency by 15 % and 25 %. 相似文献
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An Improved Gradient Projection-based Decomposition Technique for Support Vector Machines 总被引:2,自引:0,他引:2
Luca Zanni 《Computational Management Science》2006,3(2):131-145
In this paper we propose some improvements to a recent decomposition technique for the large quadratic program arising in
training support vector machines. As standard decomposition approaches, the technique we consider is based on the idea to
optimize, at each iteration, a subset of the variables through the solution of a quadratic programming subproblem. The innovative
features of this approach consist in using a very effective gradient projection method for the inner subproblems and a special
rule for selecting the variables to be optimized at each step. These features allow to obtain promising performance by decomposing
the problem into few large subproblems instead of many small subproblems as usually done by other decomposition schemes. We
improve this technique by introducing a new inner solver and a simple strategy for reducing the computational cost of each
iteration. We evaluate the effectiveness of these improvements by solving large-scale benchmark problems and by comparison
with a widely used decomposition package. 相似文献
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Ⅰ线光致抗蚀剂可以同时实用电子束和光学系统曝光,在50kV加速电压下,其曝光剂量为50-100μC/cm^2,曝光后在0.7%NaOH溶液内显影1分钟。其灵敏度比PMMA快5倍,分辩率为0.5μm。采用两方法制备CaAsPHEMT:一种用Ⅰ线光致抗蚀剂,对源、漏及栅全部都采用电子束曝光,制备了0.5μm栅长的GaAs PHEMT;另一种将源、漏及栅分割成两部分,其中精细部分由电子束曝光,其余部分由光学系统曝光,用这种方法制备了0.25μm栅长的GaAs PHEMT。Ⅰ 相似文献